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Presentai Kimia Padatan

Electroplating of Nanocrystalline CoFeNi Soft Magnetic Thin Films from a Stable Citrate-Based Bath
by

Ahmad Muwahhid

on 2 May 2011

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Transcript of Presentai Kimia Padatan

Electroplating of Nanocrystalline CoFeNi Soft Magnetic Thin Films from a Stable Citrate-Based Bath Pendahuluan Campuran logam CoFeNi Proses elektroplating Ahmad Muwahhid
105 07 095 Cara konvensional Cara baru Lebih stabil pH lebih tinggi (>5) Stabilitas yang jelek Efisiensi kepadatan lebih besar Efisiensi kepadatan kecil pH rendah (2,5-3,0) Eksperimen Wafer Si dilapisi Ti/Au Katoda Foil Platinum Anoda Volume elektrolit 33mL Pulsed Current (PC) Duty Cycle 10ms-0,3ms on time dan 9,7 off time Agitasi Pengaduk mekanis 600rpm Proses Pelapisan Ditetapkan oleh waktu pelapisan dan rapat arus; 300menit mA/cm2 Hasil dan Pembahasan Stabilitas Plating Bath Pengaruh Amonium Sitrat Pengaruh Konsentrasi Cobalt Pengaruh Konsentrasi Besi Pengaruh Konsentrasi Nikel Pengaruh Rapat Arus Pengaruh Agitasi Pengaruh On-time Tahap Pembentukan dan Ukuran Butir di Film Deposit Sifat magnetik Disepuh Lapisan Tipis CoFeNi Kesimpulan Sitrat dapat secara efektif meningkatkan stabilitas CoFeNi Efek kompleks sitrat yang paling kuat ion Fe, ion Ni2+, dan yang paling lemah ion Co2+ Film lapis tipis CoFeNi dengan komposisi pilihan, dengan fase fcc-bcc, dengan ukuran butiran 10-20nm. Densitas fluks saturasi melebihi 2T, tetapi koercivitasnya lebih besar. Presentasi Kimia Padatan
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